Summary
Machine-generated summaryCEA-LETI in Grenoble bought a 200 mm deep silicon etching system with a 200 mm deep silicon etch chamber. The tool must perform Bosch and non-Bosch Si processes, work with fluorinated gases, and etch through the wafer. It must handle bonded wafers (silicon on glass and silicon on silicon), wafers of different thicknesses, wafers with organic layers on the back and wafers with etched backside cavities, all in automatic mode. It includes OES end-point detection, bevel edge protection and Via Reveal end-point detection. The contract was awarded to KLA Corporation. No contract value, bid count, duration or re-market date is given.
Description
Official source
Source: TED - Tenders Electronic Daily (Publications Office of the EU)
Always verify details on the official notice.
Last verified against TED - Tenders Electronic Daily (Publications Office of the EU) 1 week ago
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Market context
- Avg. open tender · Electrical machinery
- €51,831,789
- Buyer track record on Aperlena
- 75 notices tracked · 24 awarded
- €5,160,042 in awarded contracts
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