Summary
Machine-generated summaryFraunhofer IAF in Germany intends to procure one secondary ion mass spectrometer (SIMS). The instrument must enable highly sensitive, depth-resolved chemical analysis of semiconductor materials and structures, with high depth resolution and high mass resolving power. It will be used for precise dopant and impurity profiling, accurate determination of layer thickness and homogeneity, and characterization of advanced III-V and diamond-based device structures and epitaxial layers, including 150 mm substrates, supporting process development, quality control and optimization. Interested suppliers should consult the official tender documents for requirements and submission conditions.
Description
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Source: TED - Tenders Electronic Daily (Publications Office of the EU)
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Last verified against TED - Tenders Electronic Daily (Publications Office of the EU) 1 month ago
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